This book focuses on the creative use of chemistry in the fabrication of a variety of oxide and non-oxide materials which are likely to play a crucial role in the development of the next generation of microelectronics devices. It includes inorganic precursor chemistry, gas-phase and solid-state chemistry, materials science, chemical physics and chemical engineering. Highlights include the deposition of high-k dielectric gate oxides, ferroelectric oxide films for infrared and memory applications, low-k dielectrics, TiN and TaN diffusion barriers, and fresh precursors for III-V nitrides. The emphasis is on chemical methods for the controlled deposition of thin films, for which chemical vapor deposition (CVD) has proven to be a useful and versatile technique. Of particular interest is the use of liquid-injection MOCVD for the deposition of oxide multilayers and superlattices. Solution deposition techniques such as sol-gel, metalorganic decomposition (MOD), hydrothermal processing are also prominently featured. Topics include: CVD of oxide ceramics; CVD of nonoxide ceramics; solution deposition of electronic ceramics; alternative chemical processing methods and characterization of electronic ceramics.
Produkteigenschaften
- Artikelnummer: 9781558995147
- Medium: Buch
- ISBN: 978-1-55899-514-7
- Verlag: CAMBRIDGE
- Erscheinungstermin: 04.08.2000
- Sprache(n): Englisch
- Auflage: Erscheinungsjahr 2000
- Serie: MRS Proceedings
- Produktform: Gebunden
- Gewicht: 567 g
- Seiten: 330
- Format (B x H x T): 160 x 234 x 23 mm
- Ausgabetyp: Kein, Unbekannt
- Nachauflage: 978-1-107-41320-7