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Moyne / del Castillo / Hurwitz

Run-to-Run Control in Semiconductor Manufacturing

Medium: Buch
ISBN: 978-0-8493-1178-9
Verlag: Taylor & Francis
Erscheinungstermin: 30.11.2000
Lieferfrist: bis zu 10 Tage
Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.

Produkteigenschaften


  • Artikelnummer: 9780849311789
  • Medium: Buch
  • ISBN: 978-0-8493-1178-9
  • Verlag: Taylor & Francis
  • Erscheinungstermin: 30.11.2000
  • Sprache(n): Englisch
  • Auflage: 1. Auflage 2000
  • Produktform: Gebunden
  • Gewicht: 625 g
  • Seiten: 366
  • Format (B x H): 156 x 234 mm
  • Ausgabetyp: Kein, Unbekannt

Autoren/Hrsg.

Herausgeber

Moyne, James

del Castillo, Enrique

Hurwitz, Arnon M.

Introduction. Background. Identifying Target Applications for Run-to-Run Control. Developing a Run-to-Run Solution: Run-to-Run Algorithms. Developing a Run-to-Run Solution: Practical Extensions to Algorithms. Developing and Deploying Run-to-Run Solutions: Integrating Control. Run-to-Run Control System Deployment Case Studies. Advanced Topics. Conclusions. References.