Run-to-run (R2R) control is cutting-edge technology that allows modification of a product recipe between machine "runs," thereby minimizing process drift, shift, and variability-and with them, costs. Its effectiveness has been demonstrated in a variety of processes, such as vapor phase epitaxy, lithography, and chemical mechanical planarization. The only barrier to the semiconductor industry's widespread adoption of this highly effective process control is a lack of understanding of the technology. Run to Run Control in Semiconductor Manufacturing overcomes that barrier by offering in-depth analyses of R2R control.
Produkteigenschaften
- Artikelnummer: 9780849311789
- Medium: Buch
- ISBN: 978-0-8493-1178-9
- Verlag: Taylor & Francis
- Erscheinungstermin: 30.11.2000
- Sprache(n): Englisch
- Auflage: 1. Auflage 2000
- Produktform: Gebunden
- Gewicht: 625 g
- Seiten: 366
- Format (B x H): 156 x 234 mm
- Ausgabetyp: Kein, Unbekannt